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Journal Articles

Characterization and degradation of ZEP520 resist film by TOF-PSID and NEXAFS

Ikeura, Hiromi*; Sekiguchi, Tetsuhiro; Koike, Masaki*

Journal of Electron Spectroscopy and Related Phenomena, 144-147, p.453 - 455, 2005/06

https://doi.org/10.1016/j.elspec.2005.01.152
 Times Cited Count：16 Percentile：56.9(Spectroscopy)

no abstracts in English

Journal Articles

Electron beam-induced reactions of a sulfonium salt in the solid state for chemically amplified electron beam resists; Comparison with photolytic reactions

Moon, S.; Maekawa, Yasunari; Yoshida, Masaru

Journal of Photopolymer Science and Technology, 15(3), p.423 - 426, 2002/06

https://doi.org/10.2494/photopolymer.15.423
 Times Cited Count：2 Percentile：9.44(Polymer Science)

no abstracts in English

Journal Articles

A Novel electron beam-induced reaction of sulfonium salt in the crystalline state

Moon, S.; Maekawa, Yasunari; Yoshida, Masaru

Chemistry Letters, (5), p.408 - 409, 2001/05

no abstracts in English

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